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Products » Sample Preparation » Materialographic Consumables » Polishing » Oxide Suspensions » Fumed Silica 0.2 mic Water free 1 L

Fumed Silica 0.2 mic Water free 1 L


For water-free final polishing.

  • Concentration 240 gr/l

 

Shake before use.

R/S Sentence(s): R36/37/38 R22.

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