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Products » Sample Preparation » Materialographic Consumables » Polishing » Oxide Suspensions » Fumed Silica 0.2 mic Alkaline 5 L

Fumed Silica 0.2 mic Alkaline 5 L


For final polishing. With antidrying agent.

  • Concentration 238 gr/l
  • pH 9.5 - 10.5

 

Shake before use. Mix with etchants for enhanced polishing action.

R/S Sentence(s): 
R36/37/38.
H315 H319 H335

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