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Products » Sample Preparation » Materialographic Consumables » Polishing » Oxide Suspensions » Colloidal Silica 50 nm Alkaline 1 L

Colloidal Silica 50 nm Alkaline 1 L


For final polishing. With antidrying agent.

  • Median (50%) 50nm

  • Concentration 585 gr/l

  • pH 9.5 - 10.5

 

Shake before use. Mix with etchants for enhanced polishing action.

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